Laser Interference Lithography for Micro- and Nano-Fabrication: Design and Development of a Prototype for Industrial End-Users

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Description

There is an increasing interest in nanoscience and nanotechnology as a result of the new physics and chemistry that are accessible on the nanoscale and as a result of the large potential for new products and devices that they provide. Due to this fact, the ability to fabricate structures on the nanoscale with high precision and in all kinds of materials is a a very powerful issue for the development of the nanoscience and nanotechnology. Lithography and the other processes associated with it are the core of the nanotechnology revolution. One of the promising techniques for the fabrication of structures on the nanoscale is Laser Interference Lithography (LIL). LIL, often referred to as holographic or interferometric lithography, is a well-established concept largely explored in lithography. Then again, a pulsed multi- beam LIL tool for nanoscale structuring of materials that can scale beyond laboratory prototypes into cost effective industrial processes isn’t yet defined. In this document, a versatile and automatic high-power a couple of beam interference lithography system design capable of overcoming the limitations of manual setups is presented.

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